Nova Ltd.
(NASDAQ: NVMI)

Nova Measuring Instruments Ltd. (Nova) is a worldwide designer, developer and producer of integrated process control metrology systems and design, manufacture and sell metrology used in the manufacturing process of semiconductors. As of December 31, 2011, the Company has sold more than 2,500 metrology systems. Its suite of technological capabilities includes Broadband Spectrophotometry, Scatterometry and Imaging and image processing. The Company�s products include metrology systems for thin film measurement in chemical mechanical polishing and chemical vapor deposition applications, optical CD and Metal Line Thickness (MLT) systems for use in post-copper chemical mechanical polishing applications and optical critical dimension systems for lithography and etch applications. Its integrated thickness monitoring system for chemical mechanical polishing process control enables wafer-to-wafer closed loop control.

452.100 -

-23.730 (-4.99%)
价格区间 436.870 - 476.100   (8.98%)
开盘 472.950
昨收 475.830
450.000
买盘 2
453.000
卖盘 62
成交量 306,375
成交额 91,181,159
注释 -
数据延迟。最后一次更新13 Feb 2026 01:30.
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关于 Nova

Nova Measuring Instruments Ltd. (Nova) is a worldwide designer, developer and producer of integrated process control metrology systems and design, manufacture and sell metrology used in the manufacturing process of semiconductors. As of December 31, 2011, the Company has sold more than 2,500 metrology systems. Its suite of technological capabilities includes Broadband Spectrophotometry, Scatterometry and Imaging and image processing. The Company�s products include metrology systems for thin film measurement in chemical mechanical polishing and chemical vapor deposition applications, optical CD and Metal Line Thickness (MLT) systems for use in post-copper chemical mechanical polishing applications and optical critical dimension systems for lithography and etch applications. Its integrated thickness monitoring system for chemical mechanical polishing process control enables wafer-to-wafer closed loop control.

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